Overview and details of the sessions of this conference. Please select a date or location to show only sessions at that day or location. Please select a single session for detailed view (with abstracts and downloads if available).
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Session Overview |
| Date: Monday, 29/May/2023 | |
| 12:00pm - 1:15pm |
Registrations & welcome coffee Location: Jubilee Hall, Naamsestraat 22, Leuven |
| 1:15pm - 1:30pm |
Welcome Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven |
| 1:30pm - 3:00pm |
Precursor design I Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Miika Mattinen Small Molecule Inhibition on Surfaces: The Role of Carbenes and Other Ligands 1: Carleton University, Canada; 2: Western University, Canada; 3: Queen's University, Canada From Molecules to Materials: Precursor Design for the Deposition of Conductive Metals University College London, United Kingdom New non-Pyrophoric metalorganic precursors for CVD and ALD of IGZO Ruhr-Universität Bochum, Germany New Precursors for the Atomic Layer deposition of p-type SnO University of Bath, United Kingdom Iron and and cobalt second-generation precursors for the vapor-phase deposition of Fe2O3 and Co3O4 systems 1: CNR-ICMATE and INSTM, Department of Chemical Sciences, Padova University, Via Marzolo 1, 35131 Padova, Italy; 2: Catalysis Research Center & Department of Chemistry, Technische Universität München, Lichtenbergstr. 4, 85748 Garching, Germany; 3: Department of Science and High Technology, Insubria University and INSTM, Via Valleggio 11, 22100 Como, Italy; 4: Department of Chemical Sciences, Padova University and INSTM, Via Marzolo 1, 35131 Padova, Italy; 5: Klaus Müller Magnetic Resonance Laboratory, Department of Industrial Engineering, Trento University, Via Sommarive 9, 38123 Povo (TN), Italy |
| 3:00pm - 3:30pm |
Coffee break & Sponsor Exhibition Location: Jubilee Hall, Naamsestraat 22, Leuven |
| 3:30pm - 5:00pm |
Characterization I Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Neil Dasgupta Real-time monitoring of the surface chemistry of ALD processes by ambient pressure x-ray photoelectron spectroscopy Lund University, Sweden In-Situ characterization of CVD processes where plasma electrons are utilized as reducing agents 1: Department of Physics, Chemistry and Biology (IFM), Linköping University, Linköping, Sweden; 2: Institute of Physics of the Czech Academy of Sciences, Na Slovance 2, 18221 Prague, Czech Republic; 3: Ionautics AB, Kabelgatan 9B, 943 31, Öjebyn, Sweden Controlling the Hydrogen Source in zinc, titanium, and aluminum oxides deposited via Atomic Layer Deposition 1: Laboratory for Mechanics of Materials and Nanostructure, EMPA, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland; 2: Department of Materials Science, University of Leoben, Franz-Josef Strasse 18, AT-8700 Leoben, Austria; 3: Swiss Cluster AG, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland; 4: ETHZ, Ion Beam Physics, HPK H32, Schafmattstrasse 20, CH-8093 Zürich, Switzerland Ambient pressure XPS setup for studying in situ ALD 1: MAX IV Laboratory, Lund University, Lund, Sweden; 2: Department of physics, Lund University, Lund, Sweden |
| 5:00pm - 6:30pm |
Welcome reception Location: Historical Town Hall Leuven, Grote Markt 9, Leuven |
| Date: Tuesday, 30/May/2023 | ||
| 8:00am - 8:30am |
Welcome coffee & registration desk is open Location: Jubilee Hall, Naamsestraat 22, Leuven |
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| 8:30am - 10:00am |
Functional materials I Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Henrik Sønsteby Vapour deposition of functional semiconductor and heterojunction (nano-)materials for gas sensing University College London, United Kingdom Chemical vapor deposition and high-resolution patterning of a highly conductive two-dimensional coordination polymer film 1: Katholieke Universiteit Leuven, Belgium; 2: Technische Universität Dresden, Germany; 3: Institute of Ion Beam Physics and Materials Research, Germany; 4: Deutsches Elektronen-Synchrotron DESY, Germany Gradient polymer coatings deposited via initiated chemical vapor deposition (iCVD) for anti-icing applications Technische Universtät Graz, Austria ALD GST industrial processing, scaling to 300mm challenges and outcomes 1: ASM International, Belgium; 2: imec, Belgium Extraordinary slippery liquid-repellent surfaces by vapor-deposition of self-assembled monolayers 1: Department of Applied Physics, Aalto University, Finland; 2: University of Jyväskylä, Finland; 3: Department of Chemistry and Materials Science, Aalto University, Finland; 4: Department of Bioproducts and Biosystems, Aalto University, Finland; 5: Center of Excellence in Life-Inspired Hybrid Materials, Aalto University, Finland; 6: Kanazawa University, Japan |
ASD I / organic Location: Auditorium 2, Maria-Theresiacollege, St. Michael's Street 6, Leuven Chair: Anjana Devi Area-selective atomic layer deposition of nitrides and oxides using small molecule inhibitors Eindhoven University of Technology, Netherlands The Importance of Small Molecule Inhibitor Dosing Conditions during Area-Selective ALD Studied with Infrared Spectroscopy 1: University of Technology Eindhoven, The Netherlands; 2: Universidad Técnica Federico Santa María, Chile Insight into Mechanism of Area-Selective Atomic Layer Deposition of Germanium Telluride 1: KU Leuven, Belgium; 2: IMEC Belgium Bridging the Synthesis Gap: Ionic Liquids Enable Solvent-Mediated Reaction in Vapor-Phase Deposition 1: Stanford University, United States of America; 2: Yonsei University, Republic of Korea |
| 10:00am - 10:30am |
Coffee break & Sponsor Exhibition Location: Jubilee Hall, Naamsestraat 22, Leuven |
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| 10:30am - 12:00pm |
Characterization II Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Joachim Schnadt Interface formation chemistry in ALD of charge transport layers for perovskite solar cells Uppsala University, Sweden Gas-phase reactions of Zr(tmhd)4: New insights from microreactor studies using synchrotron radiation 1: Thermodynamics and CENIDE, Universitaet Duisburg-Essen, Lotharstraße 1, Duisburg, 47057, Germany; 2: Paul Scherrer Institute (PSI), Forschungsstrasse 111, Villigen, 5232, Switzerland Al2O3 growth in PMMA by SIS: in-situ thickness evolution and mass uptake investigation CNR IMM, Unit of Agrate Brianza, taly Tailoring microstructural features of industrial CVD Ti(C,N) thin hard coating 1: Saarland University, Germany; 2: Universitat Politècnica de Catalunya, Spain; 3: Sandvik Coromant, Sweden; 4: Luxembourg Institute of Science and Technology, Luxembourg |
Functional materials II Location: Auditorium 2, Maria-Theresiacollege, St. Michael's Street 6, Leuven Chair: Elisabeth Blanquet Towards fabrication of 1D BN/Carbon Van der Waals heterostructures by atomic layer deposition 1: LMI, UMR CNRS 5615, Univ Lyon, Université Claude Bernard Lyon 1, F-69622 Villeurbanne, France; 2: IRIG/MEM/LEMMA, CEA-Grenoble, 17 Avenue des Martyrs, 38054 Grenoble Cedex 09 France ALD of Unique Magnetic Thin Films Aalto University, Finland CVD processing of high quality ferromagnetic CoS2 layers 1: Inorganic Materials Chemistry, Ruhr University Bochum, Bochum, 44801, Germany; 2: Institute of Semiconductor and Solid State Physics, Johannes Kepler University, Linz, 4040, Austria Single-Step PEDOT deposition by oxidative chemical vapor deposition for opto-electronic applications 1: LGC, Université de Toulouse, CNRS, Toulouse, France.; 2: CIRIMAT, Université de Toulouse, CNRS, Toulouse, France Epitaxial LiNbO3 thin film with controlled nonstoichiometry for acoustic wave devices 1: FEMTO-ST Institute, Université de Franche-Comté, ENSMM, 25030 Besançon, France; 2: Institut Universitaire de France; 3: Annealsys, 34000 Montpellier, France; 4: Institut Jean Lamour, Université de Lorraine, CNRS, 54011 Nancy, France |
| 12:00pm - 1:30pm |
Lunch & Sponsor Exhibition Location: Jubilee Hall, Naamsestraat 22, Leuven |
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| 1:30pm - 3:00pm |
Energy-related applications and catalysis I Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Geoffrey Hyett Interfacial Engineering of Batteries and Solar Energy Materials using Atomic Layer Deposition University of Michigan, United States of America Atomic Layer Deposition of Lithium Borate and Borophosphate Thin Films for Lithium-ion Battery Applications Ghent University, Department of Solid State Sciences, CoCooN research group Spatial ALD on porous substrates for energy applications SparkNano B.V., the Netherlands Optimizing a Ni-Fe phosphate catalyst for the Oxygen Evolution Reaction using ALD Ghent University, Department of Solid State Sciences, CoCooN research group |
Metals Location: Auditorium 2, Maria-Theresiacollege, St. Michael's Street 6, Leuven Chair: Ageeth A. Bol Integrity of Graphene in Functional Nanostructures Represented by Resistively Switching Media Grown by ALD University of Tartu, Estonia MOCVD of highly active metallic iridium films using new amidinate-based precursors for water splitting 1: Inorganic Materials Chemistry, Ruhr University Bochum, Germany; 2: RUBION, Ruhr University Bochum, Germany Effect of thermal induced strain on electrical properties off-stoichiometric Cu2/3 Cr4/3O2 delafossite Luxembourg Institude of Science and Technology, Luxembourg Superconducting ultrathin TaCxN1-x films for quantum applications enabled by plasma-enhanced ALD with ion-energy control 1: Eindhoven University of Technology, Netherlands; 2: University of Glasgow, Scotland; 3: Oxford Instruments Plasma Technology, England |
| 3:00pm - 3:30pm |
Coffee break & Sponsor Exhibition Location: Jubilee Hall, Naamsestraat 22, Leuven |
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| 3:30pm - 5:00pm |
Semiconductor and nanomaterials I Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Erwin Kessels Precise doping and alloying of 2D transition metal dichalcogenides using plasma-enhanced atomic layer deposition University of Michigan, United States of America Advanced Process Design for Low-Temperature PEALD of 2D Transition Metal Dichalcogenides 1: Department of Applied Physics and Science Education, Eindhoven University of Technology, Eindhoven, The Netherlands; 2: Present address: Department of Chemistry, University of Helsinki, Finland; 3: Department of Chemistry, University of Michigan, USA Transition metal dichalcogenides grown by Direct-Liquid Injection MOCVD 1: Annealsys, 139 rue des Walkyries, 34000 Montpellier, France; 2: Laboratoire Charles Coulomb, CNRS UMR 5221, Université Montpellier, 34000 Montpellier, France; 3: Institut Européen des Membranes, CNRS UMR 5635, Université Montpellier, 34000 Montpellier, France Improving Interfacial Properties of 2D Transition Metal Dichalcogenide Gate Stacks by GdAlOx Atomic Layer Deposition 1: imec, Belgium; 2: Department of Chemistry, KU Leuven, Belgium |
Energy-related applications and catalysis II Location: Auditorium 2, Maria-Theresiacollege, St. Michael's Street 6, Leuven Chair: Andreas Georgiou Kafizas Low-temperature CVD process for Cu2O thin-film growth: applications as photodetectors and HTL for solar cells Università degli Studi di Catania, INSTM UdR Catania, Italy Steps towards atomic-layer additive manufacturing for rapid prototyping of solar cells 1: Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany; 2: ATLANT 3D Nanosystems Electric transport through CVD Molybdenum oxide films. Why these films are excellent hole transfer layers in organic light-emitting diodes? 1: NCSR "Demokritos", Institute of Nanoscience and Nanotechnology, POB 60228, 15310, Agia Paraskevi, Greece; 2: Department of Electrical and Computer Engineering, University of Thessaly, Volos, 38333, Greece Chemical deposition of Cu2O films with ultra-low resistivity: Correlation with the defect landscape LMGP/CNRS, France |
| 5:00pm - 8:00pm |
Poster session I (with reception) Location: Jubilee Hall, Naamsestraat 22, Leuven Transition metal oxide nanoheterostructures by hybrid CVD routes as heterogeneous photocatalysts for air purification 1: CNR-ICMATE and INSTM, Department of Chemical Sciences, Padova University, Via Marzolo 1, 35131 Padova, Italy; 2: Department of Inorganic Chemistry and Chemical Engineering, Córdoba University, Campus de Rabanales, Edificio Marie Curie, 1° Planta, 14071 Córdoba, Spain; 3: Department of Chemical Sciences, Padova University and INSTM, Via Marzolo 1, 35131 Padova, Italy; 4: Department of Physics and Astronomy, Padova University and INSTM, Via Marzolo 8, 35131 Padova, Italy; 5: Laboratoire CRISMAT, ENSICAEN-CNRS UMR6508, 6 boulevard Marechal Juin, 14050 Caen Cedex 4, France; 6: CIC nanoGUNE BRTA, Tolosa Hiribidea, 76, 20018 Donostia - San Sebastian, Spain Resistive switching in memristor structures with multilayer dielectrics University of Tartu, Estonia The effect of dopant element on mechanical and optical properties of Cr2O3 thin films. Laboratory of Thin Film Technology, Institute of Physics, University of Tartu Molybdenum-carbide and tungsten-carbide CVD coatings obtained by Avinit vacuum-plasma technologies. 1: PrJSC FED, Ukraine; 2: Jsc Nanotechnology, Ukraine Nano-tailored morphology of La2NiO4+δ thin films using PI-MOCVD LMGP, Univ. Grenoble Alpes, CNRS, Grenoble INP, France Impact of precursor reactivity on growth of self-assembled 3D architectures 1: Leibniz Institute of Photonic Technology Jena (IPHT), Albert-Einstein-Str. 9, 07745 Jena, Germany; 2: Inorganic Materials Chemistry, Ruhr University Bochum, Universitätsstr. 150, 44081 Bochum, Germany Conformal and superconformal chemical vapor deposition of silicon carbide coatings 1: Linköping University, Sweden; 2: SGL Carbon GmbH, Germany Encapsulating TiO2 thin films grown via Atomic Layer Deposition for biocompatible UV-activated neuronal interfaces 1: IInstitute of Condensed Matter Chemistry and Technologies for Energy, National Research Council, Italy; 2: Department of Molecular Sciences and Nanosystems, Ca’ Foscari University of Venice, Italy; 3: Institute of Condensed Matter Chemistry and Technologies for Energy, National Research Council, c/o Department of Chemical Sciences, University of Padova, Italy; 4: Department of Physics, University of Padova, Italy; 5: Department of Biomedical Sciences, University of Padova Enhancing corrosion protection properties of steel by phase control of CVD processed ZrO2 films 1: Inorganic Materials Chemistry, Ruhr University Bochum, Bochum, 44801, Germany; 2: CIRIMAT - CNRS, Université de Toulouse, Toulouse Cedex 4, France; 3: Chemistry and Materials Engineering, Fachhochschule Dortmund, 44139 Dortmund, Germany; 4: Center for Interface Dominated Materials (ZGH), Ruhr University Bochum, 44801 Bochum, Germany The use of silver CVD nanostructured substrates in analysis of low molecular weight compounds 1: Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Poland; 2: Centre for Modern Interdisciplinary Technologies, Nicolaus Copernicus University in Toruń, Poland Ruthenium Sulfide Thin Films - a New Route via MOCVD Ruhr-Universität Bochum, Germany KNbO3 thin film growth with advanced CVD precursors 1: FEMTO-ST Institute, Université de Franche-Comté, ENSMM, 25030 Besançon, France; 2: Dipartimento di Scienze Chimiche, Universita' di Catania, and INSTM UdR Catania, 95125 Catania, Italy; 3: Annealsys, 34000 Montpellier, France; 4: Institut Universitaire de France SALD deposition of ZnO coatings for flexible, transparent electrodes for localized heating of lab-on-chip devices 1: LMGP/CNRS, France; 2: Faculty of Materials Science and Engineering, Phenikaa University, Vietnam Rare-earth sulfide thin films for magneto-optical applications 1: Ruhr University Bochum, Germany; 2: TU Dortmund University, Germany; 3: Johannes Kepler University, Austria Single source precursor approach towards MoS2 thin films via MOCVD 1: Inorganic Materials Chemistry, Ruhr University Bochum, Universitätsstraße 150 44801 Bochum, Germany; 2: Applied Laser Technologies, Ruhr University Bochum, Universitätsstr. 150, Bochum, Germany Synthesis of Self-Cleaning Window Glass for Photocatalytic Oxidation of 𝑵𝑶𝒙: Effect of APCVD Synthesis Conditions Imperial College London, United Kingdom Vapour Phase Infiltration: an efficient strategy to tune microporous Metal Organic Frameworks 1: Laboratoire des Multimatériaux et Interfaces, CNRS/Université Claude Bernard Lyon 1, Villeurbanne, France; 2: Université de Versailles St-Quentin en Yvelines, Université Paris Saclay; 3: Laboratoire de Chimie, Catalyse, Polymères et Procédés, Université Lyon, Villeurbanne, France; 4: Institut des Matériaux Jean Rouxel, Université de Nantes, UMR CNRS 6502, 44322 Nantes, France Atomic-molecular layer deposition of hybrid multilayers of AlN straddled with hydroquinone nanolayers. 1: Linköping University, Sweden; 2: Rensselaer Polytechnic Institute, USA Depositing ALD-oxides on MLD-metalcones: enhancing initial growth through O2 plasma densification. Ghent University, Belgium Engineering Biomimetic Biocompatible and Selectively Antibacterial Ultrathin Films by Vapor Phase Chemistry 1: CIC nanoGUNE, Spain; 2: Tyndall National Institute, University College Cork, Ireland.; 3: IKERBASQUE, Basque Foundation for Science,Spain.; 4: Department of Physics and Centre for Micro- and Nanosciences and Technologies, University of Rijeka, Croatia.; 5: CIC bioGUNE, Bizkaia Science and Technology Park, building 800, Derio (Bizkaia) 48160 Derio, Biscay, Spain. MOCVD of spinel ferrite film for applications in photoelectrochemical cells 1: Università degli studi di Catania, Italy; 2: INSTM UdR Catania Towards perovskite solar cells made by atomic layer deposition University of Helsinki, Finland Atomic Layer Deposition of Li4Ti5O12: Towards High-Capacity 3D Thin-Film Batteries Fraunhofer IPMS, Germany Macroscopically uniform distribution of platinum over mesoporous γ-alumina by a scalable atomic layer deposition process 1: Delft University of Technology, Netherlands, The; 2: Aalto University, Finland; 3: IONTOF GmbH, Münster, Germany Interplay between coordination sphere engineering and properties of nickel precursors for NiO thin films 1: University of Padova, Italy; 2: University of Insubria, Italy; 3: Technische Universität München, Germany; 4: University of Trento, Italy Stabilized Aluminum Hydride Complexes as Potential Precursors for Vapor Phase Deposition Processes Inorganic Materials Chemistry, Ruhr-University Bochum, Germany ZnS Buffer Layers: Novel Precursors for AA-CVD University of Bath, United Kingdom New Precursors to Printed Electronic Metal Oxides 1: University of Bath, United Kingdom; 2: Centre for Doctoral Training in Aerosol Science, University of Bristol, United Kingdom Development of Single-Source Precursors for Chemical Vapour Deposition of Lithium Sulfide (Li2Sx) 1: University of Bath, United Kingdom; 2: AAPS CDT, University of Bath, United Kingdom Investigation of Bismuth ALD precursors University of Pardubice, Czech Republic |
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| Date: Wednesday, 31/May/2023 | |
| 8:00am - 8:30am |
Welcome coffee & registration desk is open Location: Jubilee Hall, Naamsestraat 22, Leuven |
| 8:30am - 10:00am |
Modeling Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Sean Thomas Barry Mechanisms of atomic level processing from first principles simulations Tyndall National Institute, Ireland Predicting microstructural changes in a CVD reactor thanks to CFD simulation of the local supersaturation 1: Université Grenoble Alpes, CNRS, Grenoble INP (Institute of Engineering), SIMaP, France; 2: MERSEN Diffusion-reaction model for conformality evolution in ALD on spherical porous catalyst particles 1: VTT Techical Research Centre of Finland, Finland; 2: Aalto University School of Chemical Engineering DFT Modeling Study: Inhibition of Silica by Small Molecule Inhibitors in the AS-ALD of Al2O3 Universität Leipzig, Germany |
| 10:00am - 10:30am |
Coffee break & Sponsor Exhibition Location: Jubilee Hall, Naamsestraat 22, Leuven |
| 10:30am - 12:00pm |
Organic and hybrid materials Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Michael Nolan Vapor-Phase Synthesis and Modification of Porous Framework Thin Films Zhejiang University, China, People's Republic of Molecular layer deposition of zeolitic imidazolate framework 8 films Center for Membrane Separations, Adsorption, Catalysis, and Spectroscopy (cMACS), KU Leuven - University of Leuven, Celestijnenlaan 200F, Leuven, 3001, Belgium Towards high throughput spatial molecular layer deposition of alucone films 1: Eindhoven University of Technology, the Netherlands; 2: TNO/Holst Centre, the Netherlands Organic-Component and Ln-Ion Tailored White-Light Emitting Lanthanide-Organic Thin Films via ALD/MLD 1: Department of Chemistry and Materials Science, Aalto University, Finland; 2: Department of Chemistry, Turku University, Finland Organic-inorganic hybrid thermoelectric materials through a new concept of vapor phase infiltration (VPI) 1: CIC nanoGUNE, Spain; 2: IKERBASQUE, Basque Foundation for Science, Spain. |
| 12:00pm - 1:30pm |
Lunch & Sponsor Exhibition Location: Jubilee Hall, Naamsestraat 22, Leuven |
| 1:30pm - 5:00pm |
Social activities |
| 1:45pm | Guided city tour through Leuven Location: steps of the Historic City Hall of Leuven, Grote Markt 9, 3000 Leuven |
| 2:00pm | University library tour an tower Location: University Library, Monseigneur Ladeuzeplein 21, 3000 Leuven |
| 3:00pm | AB Inbev brewery tour Location: Visitors entrance, Aarschotsesteenweg 20, 3000 Leuven |
| 6:00pm | Conference dinner Location: Faculty Club Leuven, Great Beguinage 14, Leuven |
| Date: Thursday, 01/June/2023 | ||
| 8:00am - 8:30am |
Welcome coffee & registration desk is open Location: Jubilee Hall, Naamsestraat 22, Leuven |
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| 8:30am - 10:00am |
Energy-related applications and catalysis III Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Caroline Knapp Studying processing parameters in the CVD of TiO2 coatings on glass for NOx remediation 1: Department of Chemistry, Molecular Science Research Hub, Imperial College London, W12 0BZ, U.K; 2: Department of Chemistry, Molecular Science Research Hub, Imperial College London, W12 0BZ, U.K Protection of platinum electrocatalysts for water electrolysis using atomic layer deposition of silicon dioxide Delft University of Technology, The Netherlands Tin and Indium Sulfide by Plasma-Enhanced Atomic Layer Deposition for CO2 Electroreduction 1: University of Gent, Belgium; 2: University of Antwerp, Belgium Effect of Processing Parameters and Electrolyte Concentration on the Electrochemical Performance of Spray Deposited LiFePO4 1: Hellenic Mediterranean University, Greece; 2: IESL-FORTH, Greece; 3: University of Crete, Greece; 4: Hellenic Mediterranean University, Greece |
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| 9:00am - 10:00am |
Industry Location: Auditorium 2, Maria-Theresiacollege, St. Michael's Street 6, Leuven Chair: Adriaan J.M. Mackus Dielectric gap-fill material and process challenges for future semiconductor technology imec, Leuven, 3000, Belgium Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition 1: Linköping University; 2: Carleton University; 3: AlixLabs AB, Sweden; 4: TECHCET LLC CA; 5: BALD Engineering AB |
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| 10:00am - 10:30am |
Coffee break & Sponsor Exhibition Location: Jubilee Hall, Naamsestraat 22, Leuven |
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| 10:30am - 12:00pm |
Precursor design II Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Patrik Hoffmann Designing large aromatic molecules: Bringing colour to MLD 1: University of Oslo, Norway; 2: Institute de Chimie Moléculaire de l’Université de Bourgogne, France Development of new Li-Nb precursors for DLI-CVD process of thin LiNbO3 films 1: CP2M CPE Lyon, University Claude Bernard Lyon 1, CNRS-UMR 5128, France; 2: FEMTO-ST Institute, Besancon, University of Bourgogne-Franche-Comté, CNRS-UMR6174, France; 3: Annealsys, 139 Rue des Walkyries, 34000 Montpellier, France Atmospheric pressure vapor phase deposition of MgF2 thin films: precursor thermal properties and their applications 1: Università degli Studi di Catania, INSTM UdR Catania; 2: Univ. Grenoble Alpes, CNRS, Grenoble INP, LMGP Cost-analysis and optimization of ALD and CVD processes for halide perovskites University of Helsinki, Finland Alkali β-Diketonate Glyme Adducts as Precursors for alkali niobate films: Synthesis, Characterization and Functional Validation 1: Dipartimento Scienze Chimiche, Università degli Studi di Catania, and INSTM UdR Catania, Viale Andrea Doria 6, 95125 Catania, Italy; 2: FEMTO-ST Institute, Université Franche-Comté, ENSMM, CNRS UMR 6174, 25000 Besançon, France; 3: Dipartimento di Ingegneria Industriale, Università di Firenze, Via Santa Marta 3, 50136 Firenze, Italy; 4: Institut Universitaire de France |
Semiconductor and nanomaterials II Location: Auditorium 2, Maria-Theresiacollege, St. Michael's Street 6, Leuven Chair: Alfonso Sepulveda Marquez Nucleation and initial growth in CVD of epitaxial Boron Nitride Linköping University, Sweden Improving the quality of hexagonal boron nitride thin films grown on Ge(001)/Si substrates by CVD 1: IHP – Leibniz-Institut für innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany; 2: University Lille, CNRS, Centrale Lille, JUNIA ISEN, UPHdF, UMR 8520-IEMN F-59000 Lille, France; 3: Department of Physics, NISM Institute, University of Namur, Rue de Bruxelles 61, 5000 Namur, Belgium; 4: Semiconductor Materials, BTU Cottbus-Senftenberg, Platz der Deutschen Einheit 1, 03046 Cottbus, Germany AlScN/GaN heterostructures grown by metal-organic chemical vapour deposition using novel Sc-Precursors 1: Fraunhofer Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany; 2: Institute for Sustainable Systems Engineering, University of Freiburg, Emmy-Noether-Strasse 2, 79110 Freiburg, Germany Group III-Nitride semiconductor materials made by low temperature plasma based Atomic Layer Deposition Luxembourg Institute of Science and Technology (LIST), Luxembourg ALD-AlOx Monolayers for Modulation-Doping of Silicon Nanowires 1: TU Bergakademie Freiberg, Germany; 2: Nanoelectronic Materials Laboratory (NaMLab) gGmbH, Dresden, Germany; 3: Institute of Semiconductors and Microsystems, TU Dresden, Germany; 4: Integrated Materials Design Lab (IMDL), Australian National University (ANU), Canberra, Australia |
| 12:00pm - 1:30pm |
Lunch & Sponsor Exhibition Location: Jubilee Hall, Naamsestraat 22, Leuven |
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| 1:30pm - 3:00pm |
ASD II Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Christophe Detavernier Is HV-CVD best for all coating challenges ? 1: Empa, Switzerland; 2: EPFL, Switzerland Area-Selective Etching of Polymers for Self-Aligned Patterning University of Helsinki, Finland Area-selective ALD involving sputter yield amplification by heavy elements Eindhoven university of technology, Netherlands, The Selective ALD-Deposition of IrOx on Platinum Neural Electrodes 1: Hochschule Furtwangen, Germany; 2: Albert-Ludwigs-Universität Freiburg, Germany |
Functional materials III Location: Auditorium 2, Maria-Theresiacollege, St. Michael's Street 6, Leuven Chair: Anna Maria Coclite Self-healing of Metal Oxides enabled by Vapor Phase Infiltration 1: CIC nanoGUNE, San Sebastian, Spain; 2: IKERBASQUE, Bilbao, Spain; 3: University of Rijeka, Croatia Thick ZrO2 thermal barrier coatings produced by DLI-MOCVD on plastic molds 1: CIRIMAT - CNRS, University of Toulouse, 4, Allée Emile Monso, BP-44362, 31030 Toulouse Cedex 4, France; 2: LTDS- CNRS, ECL, 36 avenue Guy-de-Collongues, 69134 Écully cedex, France; 3: LGC - CNRS, University of Toulouse, 4, Allée Emile Monso, BP-44362, 31030 Toulouse Cedex 4, France; 4: Institut Textile et Chimique de Lyon, 87 chemin des Mouilles, 69134 Écully cedex, France Y2O3 and YF3 thermal ALD for anti-corrosion coating 1: Air Liquide Laboratories; 2: Air Liquide Advanced Materials |
| 3:00pm - 3:30pm |
Coffee break & Sponsor Exhibition Location: Jubilee Hall, Naamsestraat 22, Leuven |
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| 3:30pm - 5:00pm |
Dielectrics I Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Aile Tamm Metastable nickelates by ALD - Advantages of low temperature epitaxy University of Oslo, Department of Chemistry, Norway Effects of Interlayer Formation by Oxidants and Substrates on Properties of ALD ZrO2 Thin Film 1: Yonsei University, Korea, Republic of (South Korea); 2: Stanford University, United States HfZrO-based structures by ALD for embedded ferroelectric non-volatile memories Univ. Grenoble Alpes, CEA, Leti Evaluation of ALD Films of Y2O3, Al2O3 and Their Combinations for Hydrogen Permeation Barrier Applications Imec, Belgium |
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| 5:00pm - 8:00pm |
Poster session II (with reception) Location: Jubilee Hall, Naamsestraat 22, Leuven SMI layer decomposition - a theoretical investigation on the deposition of Al2O3 Leipzig University, Germany Area-selective ALD/MLD of noble metals and polyimide through surface-dependent film nucleation and growth University of Helsinki, Finland Correlating In-Situ Photoluminescence and Ellipsometry: A Novel approach to Analyze ALD Materials for Photovoltaic Applications 1: IPVF, Institut Photovoltaïque d’Île de France, 18 Boulevard Thomas Gobert, 91120 Palaiseau, France; 2: IPVF, UMR 9006, CNRS, IPVF SAS, Ecole Polytechnique, PSL U., 18 Bld Th. Gobert, 91120 Palaiseau, France Electronic structure, optical and electrical properties of APCVD SnO2 films. Influence of thermal cycling 1: NCSR “Demokritos”, Institute of Nanoscience and Nanotechnology, POB 60228, 15310 Agia Paraskevi, Greece; 2: University of West Attica, Dpt. of Electrical Engineering 250, Thivon Av., Aegaleo 122 44, Greece.; 3: Department of Electrical and Computer Engineering, University of Thessaly, Volos, 38333, Greece Thin film conformality characterization using imaging spectroscopic ellipsometry with the PillarHall LHAR-method 1: Chipmetrics Ltd, Finland; 2: Park Systems GmbH, Germany In Vacuo XPS Study of Al2O3 ALD Deposition Processes on GaN 1: Department of Solid State Sciences, CoCooN group, Ghent University, Belgium; 2: Ferdinand Braun Institut (FBH), Germany; 3: Plasma Process Technology Department, SENTECH Instruments GmbH, Germany Specific characterization of III-nitride thin film deposits by Plasma Enhanced Atomic Layer Deposition Luxembourg Institute of Science and Technology, Luxembourg Characterization Method of Sticking Probability for Various ALD Chemistries Relevant for Artificial Solid Electrolyte Interphases 1: Empa, Switzerland; 2: EPFL, Switzerland; 3: LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 31062 Toulouse, France Alumina layer deposited by atomic layer deposition with different precursors for different microelectronic application 1: Fraunhofer IPMS, Germany; 2: Fraunhofer Institute ENAS, Germany In-situ investigation of the physico-chemical mechanisms driving Al2O3 growth into PMMA during sequential infiltration synthesis 1: CNR-IMM, Unit of Agrate Brianza, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy ; 2: Politecnico di Milano, Dipartimento di Energia, Via Ponzio 34/3, 20133 Milano, Italy Evidence of a twin mediated growth in CVD of polycrystalline silicon carbide (3C-SiC) 1: Université Grenoble Alpes, CNRS, Grenoble INP (Institute of Engineering), SIMaP, France; 2: MERSEN Comprehensive study of the early growth stages of copper films 1: Empa - Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, Thun, CH-3602, Switzerland; 2: AGH University of Science and Technology, al. A. Mickiewicza 30, Kraków, 30-059, Poland High resolution imaging optical thickness metrology for ALD SEMILAB Co. Ltd, Hungary Ion beam analysis of ALD and CVD thin films and nanostructures imec, Belgium Development of a cobalt atomic layer deposition process using Co2(CO)6HC≡CC5H11 as precursor 1: Fraunhofer Institute for Electronic Nano Systems ENAS; 2: scia Systems GmbH; 3: Center for Microtechnologies, Chemnitz University of Technology Conformality of plasma-enhanced atomic layer deposition of silver films into lateral high aspect ratio microstructures Luxembourg Institute of Science and Technology, Luxembourg Growth and Nucleation Study of ALD Copper Thin Films 1: EMPA Swiss Federal Laboratories for Materials Science and Technology, Switzerland; 2: EPFL Swiss Federal Institute of Technology Lausanne; 3: AGH University of Science and Technology Twovalent Ru diazadienyls: A promising precursor class for the MOCVD of low resistivity thin films 1: Inorganic Materials Chemistry, Ruhr University Bochum; 2: Global Business Unit Heraeus Precious Metals, Heraeus Deutschland GmbH & Co. KG Scanning-Tunneling Microscopy Simulation through an Online Platform Espeem SARL, Luxembourg The automatic modelling system for reaction mechanisms using multi-objective optimization algorithms Shizuoka University, Japan Using SOLIDWORKS Simulation to optimise the deposition pattern of a combinatorial air pressure CVD Imperial college london, United Kingdom Flash lamp enabled atomic layer deposition of titanium oxide employing titanium isopropoxide as single-source precursor Technische Universität Dresden, Institute of Semiconductors and Microsystems, 01062 Dresden, Germany Mechanical Behavior upon Annealing-induced Blistering of Atomic Layer Deposited Alumina Thin Film Layered with Tantala University of Tartu, Estonia Minority carrier lifetime of more than 1.2ms for commercial Cz-Si(111) wafers, through ALD Al2O3 passivation 1: Indian Institute of Technology Madras, Chennai, India; 2: DST Solar Energy Harnessing Centre, Indian Institute of Technology Madras, Chennai, India Wafer scale growth of transition metal dichalkogenide films by MOCVD AIXTRON SE, Dornkaulstr. 2, Herzogenrath, 52134, Germany Titanium Nitride Thin Film Fabricated by Atomic Layer Deposition with Hydrazine and Metal-Organic Precursors RASIRC, United States of America Functionalization of gCN-based electrocatalysts with metal and metal oxide nanoparticles for the enhancement of OER 1: University of Padova, Italy; 2: National Research Council, Italy Development of Ternary ALD Chalcogenides for Memory Applications 1: IMEC, 3001 Leuven, Belgium; 2: Air Liquide Advanced Materials, Innovation Campus Delaware, Newark, DE 19702, US; 3: Air Liquide Advanced Materials, 75 quai d'Orsay, 75007 Paris, France Nucleation and initial growth stages of MoS2 by plasma ALD 1: Eindhoven University of Technology, The Netherlands; 2: University of Michigan, USA Fast Plasma ALD for Quantum: Superconducting NbN Oxford Instruments Plasma Technology, United Kingdom |
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| Date: Friday, 02/June/2023 | |
| 8:00am - 8:30am |
Welcome coffee & registration desk is open Location: Jubilee Hall, Naamsestraat 22, Leuven |
| 8:30am - 10:00am |
Dielectrics II Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Sven Van Elshocht Atomic Layer Deposition of Functional Complex Oxides for Next-generation Electronics? 1: Department of Physics and Astronomy, King's College London, United Kingdom; 2: STFC ISIS Pulsed Spallation Neutron and Muon Facility, United Kingdom; 3: Department of Chemistry, University of Helsinki, Finland; 4: Department of Physics, University of Helsinki, Finland; 5: Department of Physics, University of Jyvaskyla, Finland; 6: School of Chemistry, University of Birmingham, United Kingdom Plasma Enhanced-Atomic Layer Deposition of nanolaminates and nanocomposites Al2O3/HfO2 layers on wide band gap semiconductors 1: CNR-IMM, Strada Ottava, 5, Catania 95121, Italy; 2: Dipartimento di Scienze Chimiche, Università di Catania, Viale Andrea Doria, 6, Catania 95125, Italy; 3: STMicroelectronics, Stradale Primosole, n50 – 95121 Catania, Italy Tuning the crystallinity of Boron Nitride using Chemical Vapor Deposition Laboratoire des multimatériaux et interfaces, France Comparison of Thermal and Plasma Enhanced ALD growth of Al2O3/AlN dielectric stacks on silicon carbide 1: Istituto per la Microelettronica e Microsistemi - IMM - Sede Catania - Consiglio Nazionale delle Ricerche - CNR, Italy; 2: Dipartimento di Scienze Chimiche, Università di Catania, Viale Andrea Doria, 6, Catania 95125, Italy; 3: Centre for Energy Research, Institute of Technical Physics and Materials Science, Konkoly-Thege ut 29-33, 1121 Budapest, Hungary; 4: STMicroelectronics; Stradale Primosole, 50 – 95121 Catania, Italy |
| 10:00am - 10:30am |
Coffee break & Sponsor Exhibition Location: Jubilee Hall, Naamsestraat 22, Leuven |
| 10:30am - 12:00pm |
Novel concepts Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven Chair: Naoufal Bahlawane Synthesis of mixed anion oxynitride thin films as visible light active self-cleaning photocatalytic coatings 1: University of Southampton, United Kingdom; 2: University of Leeds< UK Stimuli-responsive thin films and their applications as actuators and on-skin sensors Graz University of Technology, Austria Competitive diffusion as a route to enhance step coverage in CVD Department of Physics, Chemistry and Biology, Linköping University, SE-581 83 Linköping, Sweden Superconductivity in Chromium Oxide Thin Films Embedding Silver 1: University of Tartu, Estonia; 2: University of Latvia, Latvia Novel metal-polymer interface engineering via combined atomic layer and physical vapor deposition 1: Empa, Switzerland; 2: Université de Poitiers, France; 3: Université Sorbonne Paris Nord, France; 4: ETH Zurich, Switzerland; 5: Montanuniversität Leoben, Austria |
| 12:00pm - 12:15pm |
Closing & announcement of best oral and poster awards (and price) Location: Auditorium 1, Promotion Hall, Naamsestraat 22, Leuven |
| 12:15pm - 1:30pm |
Lunch Location: Jubilee Hall, Naamsestraat 22, Leuven |